Metaloid Precursors, Inc.

Profile: Metaloid Precursors, Inc. is a manufacturer of semiconductor process gases that are useful for research and production. Our product line comprises of germane, digermane, and diborane gases. We employ a hybrid technique to make accurate and precise mixtures of semiconductor process gases in carrier gases such as argon, hydrogen, deuterium, helium/nitrogen. Germane gas is 2.7 times heavier than air, colorless, very toxic and has a pungent odor. The gas burns in air to produce germanium dioxide and water. We supply pure germane as a compressed gas/blended with specified electronic grade gases. It is a source of ultra pure germanium in the chemical vapor deposition of epitaxial and amorphous silicon-germanium alloys. These alloys find applications in photovoltaic power cells and in integrated circuits. Pure digermane is in the liquid state at room conditions. The vapor is 5.2 times heavier than air, colorless, and has pungent odor, at room conditions. Our products are precursor gases for depositing elemental semiconductors in downstream photovoltaic, photonic, and electronic device fabrication. We can custom-blend semiconductor process-gas mixtures for any applications.